Дослідження впливу кисню на швидкість і анізотропію глибинного травлення кремнію в плазмо-хімічному реакторі з керованим магнітним полем
The article presents the research results on the influence of the amount of oxygen in a mixture with sulfur hexafluoride on the rate and anisotropy of the silicon etching in the plasma-chemical reactor with the controlled magnetic field. The etching was performed under the pressure of (0,3—2,0)·10–3...
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| Date: | 2017 |
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| Main Authors: | , |
| Format: | Article |
| Language: | Ukrainian |
| Published: |
PE "Politekhperiodika", Book and Journal Publishers
2017
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| Subjects: | |
| Online Access: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2017.4-5.40 |
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| Journal Title: | Technology and design in electronic equipment |