Формирование нанопленок Cu, Ag, Au под воздействием атомов водорода

Due to their electrical properties, thin metallic films are widely used in modern micro- and nanoelectronics. These properties allow solving fundamental problems of surface and solid state physics. Up-to-date methods of producing thin films involve high vacuum or multi-stage processes, which calls f...

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Bibliographische Detailangaben
Datum:2015
Hauptverfasser: Zhavzharov, E. L., Matyushin, V. M.
Format: Artikel
Sprache:Ukrainian
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2015
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Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2015.5-6.41
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment