Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe

The article is devoted to studying of influence of vacuum low-temperature annealing on the electrical and photoelectric characteristics of n-ZnO-p-InSe heterostructure.Indium monoselenide (InSe) is a semiconductor of the A3B6 group of layered compounds. The basic unit consists of two planes...

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Datum:2015
Hauptverfasser: Kovalyuk, Z. D., Katerynchuk, V. M., Kudrynskyi, Z. R., Kushnir, B. V., Netyaga, V. V., Khomyak, V. V.
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Sprache:Ukrainian
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2015
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spelling oai:tkea.com.ua:article-2652025-05-30T19:32:05Z Annealing effect on I-V characteristic of n-ZnO – p-InSe heterojunction Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe Kovalyuk, Z. D. Katerynchuk, V. M. Kudrynskyi, Z. R. Kushnir, B. V. Netyaga, V. V. Khomyak, V. V. indium selenide ZnO thin film heterojunction CVC spectral photosensitivity селенид индия оксид цинка тонкая пленка гетеропереход ВАХ спектральная фоточувствительность The article is devoted to studying of influence of vacuum low-temperature annealing on the electrical and photoelectric characteristics of n-ZnO-p-InSe heterostructure.Indium monoselenide (InSe) is a semiconductor of the A3B6 group of layered compounds. The basic unit consists of two planes of metal atoms sandwiched between two planes of chalcogen atoms (Se-In-In-Se). The absence of dangling bonds on InSe cleaved surface makes it possible to use this semiconductor as a substrate for fabrication of heterostructures based on semiconductor materials with different symmetries and lattice spacings. Zinc oxide (ZnO) is the most suitable material for window materials and solar cells buffer layers application due to its marvelous transparency in the range of visible region.InSe single crystals were grown by the Bridgman technique from a nonstoichiometric melt and characterized by a pronounced layered structure along the whole length of a sample. ZnO thin oxide film was formed on freshly cleaved van der Waals surface of InSe layered crystal. n-ZnO-p-InSe heterostructure was prepared by the method of high-frequency magnetron sputtering. Sensitivity spectral areas were identified by MDR-3 monochromator with a resolution of 2.6 nm/mm.The current-voltage characteristics of the n-ZnO-p-InSe heterostructures showed a clearly pronounced diode character. In the forward bias of the initial samples, the diode factor had the value 3.7 at room temperature. It is shown that vacuum low-temperature annealing reduces shunt currents of the heterojunction, which is reflected in the decrease in the values of n from 3.7 to 2.7. Методом высокочастотного магнетронного напыления сформирована тонкая оксидная пленка ZnO на ван-дер-ваальсовой поверхности моноселенида индия. Исследовано влияние вакуумного низкотемпературного отжига на электрические и фотоэлектрические характеристики гетероперехода n-ZnO — p-InSe. Приведены температурные зависимости ВАХ гетероперехода до и после отжига. Установлена область спектральной фоточувствительности гетероструктуры n-ZnO—p-InSe. PE "Politekhperiodika", Book and Journal Publishers 2015-12-25 Article Article Peer-reviewed Article application/pdf https://www.tkea.com.ua/index.php/journal/article/view/TKEA2015.5-6.50 10.15222/TKEA2015.5-6.50 Technology and design in electronic equipment; No. 5–6 (2015): Tekhnologiya i konstruirovanie v elektronnoi apparature; 50-54 Технологія та конструювання в електронній апаратурі; № 5–6 (2015): Технология и конструирование в электронной аппаратуре; 50-54 3083-6549 3083-6530 uk https://www.tkea.com.ua/index.php/journal/article/view/TKEA2015.5-6.50/233 Copyright (c) 2015 Kovalyuk Z. D., Katerynchuk V. M., Kudrynskyi Z. R., Kushnir B. V., Netyaga V. V., Khomyak V. V. http://creativecommons.org/licenses/by/4.0/
institution Technology and design in electronic equipment
baseUrl_str
datestamp_date 2025-05-30T19:32:05Z
collection OJS
language Ukrainian
topic селенид индия
оксид цинка
тонкая пленка
гетеропереход
ВАХ
спектральная фоточувствительность
spellingShingle селенид индия
оксид цинка
тонкая пленка
гетеропереход
ВАХ
спектральная фоточувствительность
Kovalyuk, Z. D.
Katerynchuk, V. M.
Kudrynskyi, Z. R.
Kushnir, B. V.
Netyaga, V. V.
Khomyak, V. V.
Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
topic_facet indium selenide
ZnO
thin film
heterojunction
CVC
spectral photosensitivity
селенид индия
оксид цинка
тонкая пленка
гетеропереход
ВАХ
спектральная фоточувствительность
format Article
author Kovalyuk, Z. D.
Katerynchuk, V. M.
Kudrynskyi, Z. R.
Kushnir, B. V.
Netyaga, V. V.
Khomyak, V. V.
author_facet Kovalyuk, Z. D.
Katerynchuk, V. M.
Kudrynskyi, Z. R.
Kushnir, B. V.
Netyaga, V. V.
Khomyak, V. V.
author_sort Kovalyuk, Z. D.
title Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
title_short Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
title_full Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
title_fullStr Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
title_full_unstemmed Влияние отжига на ВАХ гетероперехода n-ZnO – p-InSe
title_sort влияние отжига на вах гетероперехода n-zno – p-inse
title_alt Annealing effect on I-V characteristic of n-ZnO – p-InSe heterojunction
description The article is devoted to studying of influence of vacuum low-temperature annealing on the electrical and photoelectric characteristics of n-ZnO-p-InSe heterostructure.Indium monoselenide (InSe) is a semiconductor of the A3B6 group of layered compounds. The basic unit consists of two planes of metal atoms sandwiched between two planes of chalcogen atoms (Se-In-In-Se). The absence of dangling bonds on InSe cleaved surface makes it possible to use this semiconductor as a substrate for fabrication of heterostructures based on semiconductor materials with different symmetries and lattice spacings. Zinc oxide (ZnO) is the most suitable material for window materials and solar cells buffer layers application due to its marvelous transparency in the range of visible region.InSe single crystals were grown by the Bridgman technique from a nonstoichiometric melt and characterized by a pronounced layered structure along the whole length of a sample. ZnO thin oxide film was formed on freshly cleaved van der Waals surface of InSe layered crystal. n-ZnO-p-InSe heterostructure was prepared by the method of high-frequency magnetron sputtering. Sensitivity spectral areas were identified by MDR-3 monochromator with a resolution of 2.6 nm/mm.The current-voltage characteristics of the n-ZnO-p-InSe heterostructures showed a clearly pronounced diode character. In the forward bias of the initial samples, the diode factor had the value 3.7 at room temperature. It is shown that vacuum low-temperature annealing reduces shunt currents of the heterojunction, which is reflected in the decrease in the values of n from 3.7 to 2.7.
publisher PE "Politekhperiodika", Book and Journal Publishers
publishDate 2015
url https://www.tkea.com.ua/index.php/journal/article/view/TKEA2015.5-6.50
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last_indexed 2025-09-24T17:30:38Z
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