Источник бескапельных плазменных потоков для наноэлектроники
The paper describes the source of solid-phase materials plasma flow generated by vacuum-arc discharge in vapours of diffuse evaporated anode. The source can efficiently create macroparticle-free plasma flows of various metals in vacuum, and provided the vacuum chamber is filled with required working...
Збережено в:
| Дата: | 2013 |
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| Автор: | |
| Формат: | Стаття |
| Мова: | Ukrainian |
| Опубліковано: |
PE "Politekhperiodika", Book and Journal Publishers
2013
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| Теми: | |
| Онлайн доступ: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2013.4.37 |
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| Назва журналу: | Technology and design in electronic equipment |
Репозитарії
Technology and design in electronic equipment| Резюме: | The paper describes the source of solid-phase materials plasma flow generated by vacuum-arc discharge in vapours of diffuse evaporated anode. The source can efficiently create macroparticle-free plasma flows of various metals in vacuum, and provided the vacuum chamber is filled with required working gases, the source creates gas and gas-metal plasma flows. The main characteristics of the discharge and the parameters of the plasma flows with compensated volume charge are presented. The source can be used for application of island and thin metal films on substrates of different materials, including dielectrics. |
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