Технология создания легированных бором слоев на алмазе

Технология создания легированных бором слоев на алмазе

The authors investigated natural type IIa diamond crystals and CVD diamond films. The article presents electrophysical parameters of the structures obtained in different modes of ion implantation of boron into the crystal with further annealing. Parameters of the crystals with a high nitrogen impuri...

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Bibliographic Details
Date:2012
Main Authors: Zyablyuk, K. N., Mityagin, A. Yu., Talipov, N. H., Chucheva, G. V., Duhnovskii, M. P., Khmel’nitskii, R. A.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2012
Subjects:
алмаз
легирование бором
ионная имплантация
СВЧ-транзистор
Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2012.5.39
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment

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https://www.tkea.com.ua/index.php/journal/article/view/TKEA2012.5.39

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