Кинетика процессов осаждения пленок поликремния, легированного кислородом в про­цес­се роста

The influence of deposition conditions on composition of in-situ oxygen doped polysilicon films has been investigated. A kinetic model of adsorption-deposition process using concentrated silane and nitrous oxide has been developed. The range of optimal ratios of silane and nitrous oxide flows and de...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2012
Hauptverfasser: Nalivaiko, O. Yu., Тurtsevich, A. S.
Format: Artikel
Sprache:Ukrainian
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2012
Schlagworte:
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2012.2.37
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Technology and design in electronic equipment

Institution

Technology and design in electronic equipment