Прибор и методы измерения параметров и степени однородности пленочных структур
A design and technological analysis of the scheme for measuring ellipsometric parameters, calculating the refractive index and film thickness has been carried out. A block diagram has been developed and a prototype instrument has been created for monitoring the degree of uniformity of film structure...
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| Datum: | 2009 |
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| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | Ukrainian |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2009
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.3.40 |
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| Назва журналу: | Technology and design in electronic equipment |
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Technology and design in electronic equipment| Zusammenfassung: | A design and technological analysis of the scheme for measuring ellipsometric parameters, calculating the refractive index and film thickness has been carried out. A block diagram has been developed and a prototype instrument has been created for monitoring the degree of uniformity of film structures during their fabrication. A package of automated programs has been developed for calculating the refractive index and film thickness from the measured ellipsometric parameters, based on an iterative method for solving the ellipsometry equation. The instrument was tested on the example of determining the refractive index and thickness of CdTe films and HfO₂ films, which demonstrated the possibility of controlling film uniformity both across the area and in thickness. |
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