Сопротивление контактов тонкопленочного резистора
An analytical model for calculating the contact resistance of a thin-film resistor is proposed. The dependence of contact resistance on the etching wedge is investigated. The influence of the adhesive layer on the temperature stability of the resistor is considered. Formulas for calculating the syst...
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| Datum: | 2008 |
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| 1. Verfasser: | |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2008
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.5.20 |
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| Назва журналу: | Technology and design in electronic equipment |
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Technology and design in electronic equipment| Zusammenfassung: | An analytical model for calculating the contact resistance of a thin-film resistor is proposed. The dependence of contact resistance on the etching wedge is investigated. The influence of the adhesive layer on the temperature stability of the resistor is considered. Formulas for calculating the systematic and random errors introduced by contact resistance are obtained. |
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