Испаритель для термического напыления материалов в вакууме
The design of an evaporator intended for material deposition in vacuum-coating systems is considered, which has been successfully employed in the technological process of fabricating gallium arsenide transistors, diodes, and monolithic circuits.
Збережено в:
| Дата: | 2008 |
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| Автори: | , , |
| Формат: | Стаття |
| Мова: | Українська |
| Опубліковано: |
PE "Politekhperiodika", Book and Journal Publishers
2008
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| Теми: | |
| Онлайн доступ: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.5.56 |
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| Назва журналу: | Technology and design in electronic equipment |
Репозитарії
Technology and design in electronic equipment| Резюме: | The design of an evaporator intended for material deposition in vacuum-coating systems is considered, which has been successfully employed in the technological process of fabricating gallium arsenide transistors, diodes, and monolithic circuits. |
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