Осаждение пленок TiN и TiO2 в обращенном цилиндрическом магнетроне методом реактивного распыления

• Date: 2008
• Main Authors: Kostin, E. G., Demchyshyn, A. V.
• Format: Article
• Language: Ukrainian
• Published: PE "Politekhperiodika", Book and Journal Publishers 2008
• Subjects: ре­ак­тив­ное рас­пы­ле­ние; магнетрон; оп­ти­чес­кое из­лу­че­ние плаз­мы; плен­ки TiN; плен­ки TiO2
• Online Access: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.4.47
• Journal Title: Technology and design in electronic equipment

The results of a study of the optical emission of discharge plasma in the wavelength range of 350–820 nm and the discharge voltage of an inverted cylindrical magnetron under various flows of reactive gases (N₂, O₂) are presented. The variation in discharge voltage exhibits features that can be corre...