Методы удаления дефектов, возникающих при жидкостном травлении поверхности поликристаллического кремния

• Date: 2008
• Main Authors: Ivanchykou, A. E., Kisel, A. М., Medvedeva, А. V., Plebanovich, B. I.
• Format: Article
• Language: Ukrainian
• Published: PE "Politekhperiodika", Book and Journal Publishers 2008
• Subjects: производство полупроводниковых приборов; химочистка; дефекты в виде пятен
• Online Access: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2008.1.42
• Journal Title: Technology and design in electronic equipment

A model of defect formation in the form of spots on the surface of polycrystalline silicon during the processing of semiconductor wafers in an etchant based on hydrofluoric acid is considered, as well as a model of defect removal in chemical solutions. The influence of centrifuge rotation speed duri...