Коррекция оптических эффектов близости при проектировании микросхем
Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally verified
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| Datum: | 2007 |
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| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | Ukrainisch |
| Veröffentlicht: |
PE "Politekhperiodika", Book and Journal Publishers
2007
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| Schlagworte: | |
| Online Zugang: | https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.30 |
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| Назва журналу: | Technology and design in electronic equipment |
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