Формирование прозрачных омических контактов к р-GaN для светоизлучающих диодов

Results of studies on ohmic contacts based on Ni/Au films to the p-type GaN region are presented. The influence of Ni/Au layer thickness, deposition conditions, and contact formation regimes on specific contact resistance, element redistribution in metal–semiconductor structures, and optical propert...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Datum:2007
Hauptverfasser: Bosiy, V. I., Danilov, N. G., Cohan, V. P., Novitskiy, V. А., Semashko, Е. М., Tkachenko, V. V., Shponiak, T. A.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2007
Schlagworte:
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.43
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:Technology and design in electronic equipment

Institution

Technology and design in electronic equipment