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Наноструктурированные пленки ZnO для устройств микроэлектроники и оптики

ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the develop...

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Bibliographische Detailangaben
Datum:2006
Hauptverfasser: Belyanin, A. F., Krivchenko, V. A., Lopaev, D. V., Pavlushkin, L. V., Paschenko, P. V., Pirogov, V. G., Polyakov, S. N., Suetin, N. V., Sushentsov, N. I.
Format: Artikel
Sprache:Ukrainisch
Veröffentlicht: PE "Politekhperiodika", Book and Journal Publishers 2006
Schlagworte:
пленки ZnO
магнетронное распыление
электроника
оптика
Online Zugang:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.6.48
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Назва журналу:Technology and design in electronic equipment

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Technology and design in electronic equipment
Beschreibung
Zusammenfassung:ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the development of surface acoustic wave filters and ultraviolet mirrors

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