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Наноструктурированные пленки ZnO для устройств микроэлектроники и оптики

ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the develop...

Повний опис

Збережено в:
Бібліографічні деталі
Дата:2006
Автори: Belyanin, A. F., Krivchenko, V. A., Lopaev, D. V., Pavlushkin, L. V., Paschenko, P. V., Pirogov, V. G., Polyakov, S. N., Suetin, N. V., Sushentsov, N. I.
Формат: Стаття
Мова:Українська
Опубліковано: PE "Politekhperiodika", Book and Journal Publishers 2006
Теми:
пленки ZnO
магнетронное распыление
электроника
оптика
Онлайн доступ:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.6.48
Теги: Додати тег
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Назва журналу:Technology and design in electronic equipment

Репозитарії

Technology and design in electronic equipment
Опис
Резюме:ZnO films were obtained by RF magnetron sputtering. An additional magnetic field was applied using a magnetic system placed behind the substrate holder. The influence of process parameters on the structure and functional properties of the films was established. ZnO films were employed in the development of surface acoustic wave filters and ultraviolet mirrors

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