Комплексно-легированные эпитаксиальные структуры InP/InGaAsP для оптоэлектроники

The influence of complex doping with rare-earth elements (Yb, Gd) and aluminum on the electrophysical properties of InGaAsP layers grown by liquid-phase epitaxy has been studied. Using a technological approach based on complex doping, InP/InGaAsP epitaxial structures for photodetectors were obtained...

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Bibliographic Details
Date:2026
Main Author: Krukovsky, S. I.
Format: Article
Language:Ukrainian
Published: PE "Politekhperiodika", Book and Journal Publishers 2026
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Online Access:https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.2.27
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Journal Title:Technology and design in electronic equipment

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Technology and design in electronic equipment
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Summary:The influence of complex doping with rare-earth elements (Yb, Gd) and aluminum on the electrophysical properties of InGaAsP layers grown by liquid-phase epitaxy has been studied. Using a technological approach based on complex doping, InP/InGaAsP epitaxial structures for photodetectors were obtained. On the basis of these structures, mesa photodiodes were fabricated with an active area of 0.3·10–2 cm² and dark currents not exceeding 10–9 A at 300 K.