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Influence of SiOx-film deposited by thermal evaporation on the near-bandedge luminescence of mono-crystalline silicon

Influence of SiOx-film deposited by thermal evaporation on the near-bandedge luminescence of mono-crystalline silicon

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Bibliographic Details
Main Authors: N. A. Vlasenko, N. V. Sopinskij, E. G. Gule, L. I. Veligura, Ja. Bratus, R. S. Melnik, Z. L. Denisova, M. A. Mukhlo
Format: Article
Language:English
Published: 2010
Series:Optoelectronics and Semiconductor Technique
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000363613
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