Lisovskij, V., But, Z., Landri, K., Due, D., & Kasan, V. (2004). Plasma cleaning of technological chambers in rf capacitive discharges.
Chicago Style (17th ed.) CitationLisovskij, V., Zh.-P But, K. Landri, D. Due, and V. Kasan. Plasma Cleaning of Technological Chambers in Rf Capacitive Discharges. 2004.
MLA (8th ed.) CitationLisovskij, V., et al. Plasma Cleaning of Technological Chambers in Rf Capacitive Discharges. 2004.
Warning: These citations may not always be 100% accurate.