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Plasma cleaning of technological chambers in rf capacitive discharges

Plasma cleaning of technological chambers in rf capacitive discharges

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Bibliographic Details
Main Authors: V. Lisovskij, Zh.-P. But, K. Landri, D. Due, V. Kasan
Format: Article
Language:English
Published: 2004
Series:Physical surface engineering
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000849749
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id open-sciencenbuvgovua-106806
record_format dspace
spelling open-sciencenbuvgovua-1068062024-04-17T19:09:48Z Plasma cleaning of technological chambers in rf capacitive discharges V. Lisovskij Zh.-P. But K. Landri D. Due V. Kasan 1999-8074 2004 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000849749 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Physical surface engineering
spellingShingle Physical surface engineering
V. Lisovskij
Zh.-P. But
K. Landri
D. Due
V. Kasan
Plasma cleaning of technological chambers in rf capacitive discharges
format Article
author V. Lisovskij
Zh.-P. But
K. Landri
D. Due
V. Kasan
author_facet V. Lisovskij
Zh.-P. But
K. Landri
D. Due
V. Kasan
author_sort V. Lisovskij
title Plasma cleaning of technological chambers in rf capacitive discharges
title_short Plasma cleaning of technological chambers in rf capacitive discharges
title_full Plasma cleaning of technological chambers in rf capacitive discharges
title_fullStr Plasma cleaning of technological chambers in rf capacitive discharges
title_full_unstemmed Plasma cleaning of technological chambers in rf capacitive discharges
title_sort plasma cleaning of technological chambers in rf capacitive discharges
publishDate 2004
url http://jnas.nbuv.gov.ua/article/UJRN-0000849749
work_keys_str_mv AT vlisovskij plasmacleaningoftechnologicalchambersinrfcapacitivedischarges
AT zhpbut plasmacleaningoftechnologicalchambersinrfcapacitivedischarges
AT klandri plasmacleaningoftechnologicalchambersinrfcapacitivedischarges
AT ddue plasmacleaningoftechnologicalchambersinrfcapacitivedischarges
AT vkasan plasmacleaningoftechnologicalchambersinrfcapacitivedischarges
first_indexed 2024-04-18T06:08:02Z
last_indexed 2024-04-18T06:08:02Z
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