Automated system for real-time control of plasma-chemical etching process in ICP

Збережено в:
Бібліографічні деталі
Дата:2006
Автор: S. V. Dudin
Формат: Стаття
Мова:Англійська
Опубліковано: 2006
Назва видання:Physical surface engineering
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000855346
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

Репозитарії

Library portal of National Academy of Sciences of Ukraine | LibNAS
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author S. V. Dudin
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spelling open-sciencenbuvgovua-1068432024-04-17T19:10:02Z Automated system for real-time control of plasma-chemical etching process in ICP S. V. Dudin 1999-8074 2006 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000855346 Article
spellingShingle Physical surface engineering
S. V. Dudin
Automated system for real-time control of plasma-chemical etching process in ICP
title Automated system for real-time control of plasma-chemical etching process in ICP
title_full Automated system for real-time control of plasma-chemical etching process in ICP
title_fullStr Automated system for real-time control of plasma-chemical etching process in ICP
title_full_unstemmed Automated system for real-time control of plasma-chemical etching process in ICP
title_short Automated system for real-time control of plasma-chemical etching process in ICP
title_sort automated system for real-time control of plasma-chemical etching process in icp
url http://jnas.nbuv.gov.ua/article/UJRN-0000855346
work_keys_str_mv AT svdudin automatedsystemforrealtimecontrolofplasmachemicaletchingprocessinicp