Dudin, S. V. (2009). Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures.
Chicago-Zitierstil (17. Ausg.)Dudin, S. V. Research and Development of Technological Systems Based on High-frequency Induction Discharge for Reactive Ion-plasma Etching of Micro- and Nanostructures. 2009.
MLA-Zitierstil (8. Ausg.)Dudin, S. V. Research and Development of Technological Systems Based on High-frequency Induction Discharge for Reactive Ion-plasma Etching of Micro- and Nanostructures. 2009.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.