Dudin, S. V. (2009). Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures.
Чикаго стиль цитування (17-те видання)Dudin, S. V. Research and Development of Technological Systems Based on High-frequency Induction Discharge for Reactive Ion-plasma Etching of Micro- and Nanostructures. 2009.
Стиль цитування MLA (8-ме видання)Dudin, S. V. Research and Development of Technological Systems Based on High-frequency Induction Discharge for Reactive Ion-plasma Etching of Micro- and Nanostructures. 2009.
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