Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
Збережено в:
| Дата: | 2009 |
|---|---|
| Автор: | |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
2009
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| Назва видання: | Physical surface engineering |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000872969 |
| Теги: |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| _version_ | 1859606691074539520 |
|---|---|
| author | S. V. Dudin |
| author_facet | S. V. Dudin |
| author_sort | S. V. Dudin |
| collection | Open-Science |
| first_indexed | 2025-07-22T17:33:51Z |
| format | Article |
| id | open-sciencenbuvgovua-107852 |
| institution | Library portal of National Academy of Sciences of Ukraine | LibNAS |
| language | English |
| last_indexed | 2025-07-22T17:33:51Z |
| publishDate | 2009 |
| record_format | dspace |
| series | Physical surface engineering |
| spelling | open-sciencenbuvgovua-1078522024-04-17T19:15:57Z Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures S. V. Dudin 1999-8074 2009 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000872969 Article |
| spellingShingle | Physical surface engineering S. V. Dudin Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title | Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_full | Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_fullStr | Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_full_unstemmed | Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_short | Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| title_sort | research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures |
| url | http://jnas.nbuv.gov.ua/article/UJRN-0000872969 |
| work_keys_str_mv | AT svdudin researchanddevelopmentoftechnologicalsystemsbasedonhighfrequencyinductiondischargeforreactiveionplasmaetchingofmicroandnanostructures |