Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures

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Datum:2009
1. Verfasser: S. V. Dudin
Format: Artikel
Sprache:Englisch
Veröffentlicht: 2009
Schriftenreihe:Physical surface engineering
Online Zugang:http://jnas.nbuv.gov.ua/article/UJRN-0000872969
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author S. V. Dudin
author_facet S. V. Dudin
author_sort S. V. Dudin
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
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publishDate 2009
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spelling open-sciencenbuvgovua-1078522024-04-17T19:15:57Z Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures S. V. Dudin 1999-8074 2009 en Physical surface engineering http://jnas.nbuv.gov.ua/article/UJRN-0000872969 Article
spellingShingle Physical surface engineering
S. V. Dudin
Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title_full Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title_fullStr Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title_full_unstemmed Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title_short Research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
title_sort research and development of technological systems based on high-frequency induction discharge for reactive ion-plasma etching of micro- and nanostructures
url http://jnas.nbuv.gov.ua/article/UJRN-0000872969
work_keys_str_mv AT svdudin researchanddevelopmentoftechnologicalsystemsbasedonhighfrequencyinductiondischargeforreactiveionplasmaetchingofmicroandnanostructures