External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process

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Бібліографічні деталі
Дата:2018
Автори: W. Thongpan, T. Kumpika, E. Kantarak, A. Panthawan, P. Pooseekheaw, P. Singjai, W. Thongsuwan, A. Tuantranont
Формат: Стаття
Мова:English
Опубліковано: 2018
Назва видання:Ukrainian journal of physics
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000883358
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

Репозитарії

Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-270342024-02-27T21:46:37Z External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process W. Thongpan T. Kumpika E. Kantarak A. Panthawan P. Pooseekheaw P. Singjai W. Thongsuwan A. Tuantranont 2071-0186 2018 en Ukrainian journal of physics http://jnas.nbuv.gov.ua/article/UJRN-0000883358 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Ukrainian journal of physics
spellingShingle Ukrainian journal of physics
W. Thongpan
T. Kumpika
E. Kantarak
A. Panthawan
P. Pooseekheaw
P. Singjai
W. Thongsuwan
A. Tuantranont
External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
format Article
author W. Thongpan
T. Kumpika
E. Kantarak
A. Panthawan
P. Pooseekheaw
P. Singjai
W. Thongsuwan
A. Tuantranont
author_facet W. Thongpan
T. Kumpika
E. Kantarak
A. Panthawan
P. Pooseekheaw
P. Singjai
W. Thongsuwan
A. Tuantranont
author_sort W. Thongpan
title External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
title_short External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
title_full External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
title_fullStr External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
title_full_unstemmed External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
title_sort external-electric-field-enhanced uniformity and deposition rate of a tio2 film prepared by the sparking process
publishDate 2018
url http://jnas.nbuv.gov.ua/article/UJRN-0000883358
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AT ekantarak externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
AT apanthawan externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
AT ppooseekheaw externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
AT psingjai externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
AT wthongsuwan externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
AT atuantranont externalelectricfieldenhanceduniformityanddepositionrateofatio2filmpreparedbythesparkingprocess
first_indexed 2024-03-30T08:15:11Z
last_indexed 2024-03-30T08:15:11Z
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