External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process
Збережено в:
| Дата: | 2018 |
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| Автори: | , , , , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
2018
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| Назва видання: | Ukrainian Journal of Physics |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000883392 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| _version_ | 1859507890444828672 |
|---|---|
| author | W. Thongpan T. Kumpika E. Kantarak A. Panthawan P. Pooseekheaw P. Singjai W. Thongsuwan A. Tuantranont |
| author_facet | W. Thongpan T. Kumpika E. Kantarak A. Panthawan P. Pooseekheaw P. Singjai W. Thongsuwan A. Tuantranont |
| author_sort | W. Thongpan |
| collection | Open-Science |
| first_indexed | 2025-07-17T14:51:58Z |
| format | Article |
| id | open-sciencenbuvgovua-27057 |
| institution | Library portal of National Academy of Sciences of Ukraine | LibNAS |
| language | English |
| last_indexed | 2025-07-17T14:51:58Z |
| publishDate | 2018 |
| record_format | dspace |
| series | Ukrainian Journal of Physics |
| spelling | open-sciencenbuvgovua-270572024-02-27T21:46:43Z External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process W. Thongpan T. Kumpika E. Kantarak A. Panthawan P. Pooseekheaw P. Singjai W. Thongsuwan A. Tuantranont 0372-400X 2018 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000883392 Article |
| spellingShingle | Ukrainian Journal of Physics W. Thongpan T. Kumpika E. Kantarak A. Panthawan P. Pooseekheaw P. Singjai W. Thongsuwan A. Tuantranont External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title | External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title_full | External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title_fullStr | External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title_full_unstemmed | External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title_short | External-electric-field-enhanced uniformity and deposition rate of a TiO2 film prepared by the sparking process |
| title_sort | external-electric-field-enhanced uniformity and deposition rate of a tio2 film prepared by the sparking process |
| url | http://jnas.nbuv.gov.ua/article/UJRN-0000883392 |
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