Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing
Збережено в:
| Дата: | 2017 |
|---|---|
| Автори: | , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
2017
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| Назва видання: | Semiconductor Physics, Quantum Electronics and Optoelectronics |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000714494 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| id |
open-sciencenbuvgovua-36194 |
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| record_format |
dspace |
| spelling |
open-sciencenbuvgovua-361942024-02-29T11:30:56Z Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing A. V. Fomin G. A. Pashchenko Yu. Kravetskyi I. G. Lutsyshyn 1560-8034 2017 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000714494 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Semiconductor Physics, Quantum Electronics and Optoelectronics |
| spellingShingle |
Semiconductor Physics, Quantum Electronics and Optoelectronics A. V. Fomin G. A. Pashchenko Yu. Kravetskyi I. G. Lutsyshyn Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| format |
Article |
| author |
A. V. Fomin G. A. Pashchenko Yu. Kravetskyi I. G. Lutsyshyn |
| author_facet |
A. V. Fomin G. A. Pashchenko Yu. Kravetskyi I. G. Lutsyshyn |
| author_sort |
A. V. Fomin |
| title |
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| title_short |
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| title_full |
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| title_fullStr |
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| title_full_unstemmed |
Model of smoothing roughness on GaAs wafer surface by using nonabrasive chemical-and-mechanical polishing |
| title_sort |
model of smoothing roughness on gaas wafer surface by using nonabrasive chemical-and-mechanical polishing |
| publishDate |
2017 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000714494 |
| work_keys_str_mv |
AT avfomin modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing AT gapashchenko modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing AT yukravetskyi modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing AT iglutsyshyn modelofsmoothingroughnessongaaswafersurfacebyusingnonabrasivechemicalandmechanicalpolishing |
| first_indexed |
2024-03-30T08:59:40Z |
| last_indexed |
2024-03-30T08:59:40Z |
| _version_ |
1796881048190058496 |