The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method - A. I. Ievtushenko; M. G. Dusheyko; V. A. Karpyna; O. I. Bykov; P. M. Lytvyn; O. I. Olifan; V. A. Levchenko; A. A. Korchovyi; S. P. Starik; S. V. Tkach; E. F. Kuzmenko; G. V. Lashkarev (Semiconductor Physics, Quantum Electronics and Optoelectronics, 2017)