Gladkovskij, V. V., & Fedorovich, O. A. (2017). Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field.
Chicago-Zitierstil (17. Ausg.)Gladkovskij, V. V., und O. A. Fedorovich. Investigation of the Influence of Oxygen on the Rate and Anisotropy of Deep Etching of Silicon in the Plasma-chemical Reactor with the Controlled Magnetic Field. 2017.
MLA-Zitierstil (8. Ausg.)Gladkovskij, V. V., und O. A. Fedorovich. Investigation of the Influence of Oxygen on the Rate and Anisotropy of Deep Etching of Silicon in the Plasma-chemical Reactor with the Controlled Magnetic Field. 2017.
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