Investigation of the influence of oxygen on the rate and anisotropy of deep etching of silicon in the plasma-chemical reactor with the controlled magnetic field
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| Date: | 2017 |
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| Main Authors: | , |
| Format: | Article |
| Language: | English |
| Published: |
2017
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| Series: | Technology and design in electronic equipment |
| Online Access: | http://jnas.nbuv.gov.ua/article/UJRN-0000798647 |
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| Journal Title: | Library portal of National Academy of Sciences of Ukraine | LibNAS |