Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering - V. I. Popovych; A. I. Ievtushenko; O. S. Lytvyn; V. R. Romanjuk; V. M. Tkach; V. A. Baturyn; O. Y. Karpenko; M. V. Dranchuk; L. O. Klochkov; M. G. Dushejko; V. A. Karpyna; G. V. Lashkarov (Ukrainian journal of physics, 2016)