Raman scattering in the process of tin-induced crystallization of amorphous silicon

Збережено в:
Бібліографічні деталі
Дата:2016
Автори: V. B. Neimash, H. I. Dovbeshko, Ye. Shepeliavyi, V. A. Danko, V. V. Melnyk, M. V. Isaiev, A. H. Kuzmych
Формат: Стаття
Мова:Англійська
Опубліковано: 2016
Назва видання:Ukrainian Journal of Physics
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000730790
Теги: Додати тег
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author V. B. Neimash
H. I. Dovbeshko
Ye. Shepeliavyi
V. A. Danko
V. V. Melnyk
M. V. Isaiev
A. H. Kuzmych
author_facet V. B. Neimash
H. I. Dovbeshko
Ye. Shepeliavyi
V. A. Danko
V. V. Melnyk
M. V. Isaiev
A. H. Kuzmych
author_sort V. B. Neimash
collection Open-Science
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
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publishDate 2016
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series Ukrainian Journal of Physics
spelling open-sciencenbuvgovua-524712024-02-29T13:06:45Z Raman scattering in the process of tin-induced crystallization of amorphous silicon V. B. Neimash H. I. Dovbeshko Ye. Shepeliavyi V. A. Danko V. V. Melnyk M. V. Isaiev A. H. Kuzmych 0372-400X 2016 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000730790 Article
spellingShingle Ukrainian Journal of Physics
V. B. Neimash
H. I. Dovbeshko
Ye. Shepeliavyi
V. A. Danko
V. V. Melnyk
M. V. Isaiev
A. H. Kuzmych
Raman scattering in the process of tin-induced crystallization of amorphous silicon
title Raman scattering in the process of tin-induced crystallization of amorphous silicon
title_full Raman scattering in the process of tin-induced crystallization of amorphous silicon
title_fullStr Raman scattering in the process of tin-induced crystallization of amorphous silicon
title_full_unstemmed Raman scattering in the process of tin-induced crystallization of amorphous silicon
title_short Raman scattering in the process of tin-induced crystallization of amorphous silicon
title_sort raman scattering in the process of tin-induced crystallization of amorphous silicon
url http://jnas.nbuv.gov.ua/article/UJRN-0000730790
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