Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering
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| Datum: | 2016 |
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| Format: | Artikel |
| Sprache: | English |
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2016
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| Schriftenreihe: | Ukrainian Journal of Physics |
| Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000732262 |
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open-sciencenbuvgovua-524912024-02-29T13:06:52Z Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering V. I. Popovych A. I. Yevtushenko O. S. Lytvyn V. R. Romaniuk V. M. Tkach V. A. Baturyn Ye. Karpenko M. V. Dranchuk L. O. Klochkov M. H. Dusheiko V. A. Karpyna H. V. Lashkarov 0372-400X 2016 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000732262 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Ukrainian Journal of Physics |
| spellingShingle |
Ukrainian Journal of Physics V. I. Popovych A. I. Yevtushenko O. S. Lytvyn V. R. Romaniuk V. M. Tkach V. A. Baturyn Ye. Karpenko M. V. Dranchuk L. O. Klochkov M. H. Dusheiko V. A. Karpyna H. V. Lashkarov Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| format |
Article |
| author |
V. I. Popovych A. I. Yevtushenko O. S. Lytvyn V. R. Romaniuk V. M. Tkach V. A. Baturyn Ye. Karpenko M. V. Dranchuk L. O. Klochkov M. H. Dusheiko V. A. Karpyna H. V. Lashkarov |
| author_facet |
V. I. Popovych A. I. Yevtushenko O. S. Lytvyn V. R. Romaniuk V. M. Tkach V. A. Baturyn Ye. Karpenko M. V. Dranchuk L. O. Klochkov M. H. Dusheiko V. A. Karpyna H. V. Lashkarov |
| author_sort |
V. I. Popovych |
| title |
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| title_short |
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| title_full |
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| title_fullStr |
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| title_full_unstemmed |
Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering |
| title_sort |
effect of argon deposition pressure on the properties of aluminum-doped zno films deposited layer-by-layer using magnetron sputtering |
| publishDate |
2016 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000732262 |
| work_keys_str_mv |
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| first_indexed |
2025-07-17T23:04:51Z |
| last_indexed |
2025-07-17T23:04:51Z |
| _version_ |
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