Theoretical study on laser annealing of non-stoichiometric SiOX films

Збережено в:
Бібліографічні деталі
Дата:2014
Автор: O. O. Gavrylyuk
Формат: Стаття
Мова:Англійська
Опубліковано: 2014
Назва видання:Chemistry, physics and technology of surface
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000282189
Теги: Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

Репозитарії

Library portal of National Academy of Sciences of Ukraine | LibNAS
_version_ 1859528990765613056
author O. O. Gavrylyuk
author_facet O. O. Gavrylyuk
author_sort O. O. Gavrylyuk
collection Open-Science
first_indexed 2025-07-22T06:32:23Z
format Article
id open-sciencenbuvgovua-70750
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
last_indexed 2025-07-22T06:32:23Z
publishDate 2014
record_format dspace
series Chemistry, physics and technology of surface
spelling open-sciencenbuvgovua-707502024-04-16T16:44:05Z Theoretical study on laser annealing of non-stoichiometric SiOX films O. O. Gavrylyuk 2079-1704 2014 en Chemistry, physics and technology of surface http://jnas.nbuv.gov.ua/article/UJRN-0000282189 Article
spellingShingle Chemistry, physics and technology of surface
O. O. Gavrylyuk
Theoretical study on laser annealing of non-stoichiometric SiOX films
title Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full Theoretical study on laser annealing of non-stoichiometric SiOX films
title_fullStr Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full_unstemmed Theoretical study on laser annealing of non-stoichiometric SiOX films
title_short Theoretical study on laser annealing of non-stoichiometric SiOX films
title_sort theoretical study on laser annealing of non-stoichiometric siox films
url http://jnas.nbuv.gov.ua/article/UJRN-0000282189
work_keys_str_mv AT oogavrylyuk theoreticalstudyonlaserannealingofnonstoichiometricsioxfilms