Theoretical study on laser annealing of non-stoichiometric SiOX films

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Datum:2014
1. Verfasser: O. O. Gavrylyuk
Format: Artikel
Sprache:Englisch
Veröffentlicht: 2014
Schriftenreihe:Chemistry, physics and technology of surface
Online Zugang:http://jnas.nbuv.gov.ua/article/UJRN-0000282189
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author O. O. Gavrylyuk
author_facet O. O. Gavrylyuk
author_sort O. O. Gavrylyuk
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
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publishDate 2014
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series Chemistry, physics and technology of surface
spelling open-sciencenbuvgovua-707502024-04-16T16:44:05Z Theoretical study on laser annealing of non-stoichiometric SiOX films O. O. Gavrylyuk 2079-1704 2014 en Chemistry, physics and technology of surface http://jnas.nbuv.gov.ua/article/UJRN-0000282189 Article
spellingShingle Chemistry, physics and technology of surface
O. O. Gavrylyuk
Theoretical study on laser annealing of non-stoichiometric SiOX films
title Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full Theoretical study on laser annealing of non-stoichiometric SiOX films
title_fullStr Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full_unstemmed Theoretical study on laser annealing of non-stoichiometric SiOX films
title_short Theoretical study on laser annealing of non-stoichiometric SiOX films
title_sort theoretical study on laser annealing of non-stoichiometric siox films
url http://jnas.nbuv.gov.ua/article/UJRN-0000282189
work_keys_str_mv AT oogavrylyuk theoreticalstudyonlaserannealingofnonstoichiometricsioxfilms