Theoretical study on laser annealing of non-stoichiometric SiOX films

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Бібліографічні деталі
Дата:2014
Автор: O. O. Gavrylyuk
Формат: Стаття
Мова:English
Опубліковано: 2014
Назва видання:Chemistry, physics and technology of surface
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000282189
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-707502024-04-16T16:44:05Z Theoretical study on laser annealing of non-stoichiometric SiOX films O. O. Gavrylyuk 2079-1704 2014 en Chemistry, physics and technology of surface http://jnas.nbuv.gov.ua/article/UJRN-0000282189 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Chemistry, physics and technology of surface
spellingShingle Chemistry, physics and technology of surface
O. O. Gavrylyuk
Theoretical study on laser annealing of non-stoichiometric SiOX films
format Article
author O. O. Gavrylyuk
author_facet O. O. Gavrylyuk
author_sort O. O. Gavrylyuk
title Theoretical study on laser annealing of non-stoichiometric SiOX films
title_short Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full Theoretical study on laser annealing of non-stoichiometric SiOX films
title_fullStr Theoretical study on laser annealing of non-stoichiometric SiOX films
title_full_unstemmed Theoretical study on laser annealing of non-stoichiometric SiOX films
title_sort theoretical study on laser annealing of non-stoichiometric siox films
publishDate 2014
url http://jnas.nbuv.gov.ua/article/UJRN-0000282189
work_keys_str_mv AT oogavrylyuk theoreticalstudyonlaserannealingofnonstoichiometricsioxfilms
first_indexed 2024-04-17T05:06:29Z
last_indexed 2024-04-17T05:06:29Z
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