Cover Image

Optical and structural studies of phase transformations and composition fluctuations at annealing of Zn1-xCdxO films grown by dc magnetron sputtering

Saved in:

Bibliographic Details
Date:	2014
Main Authors:	O. Kolomys, A. Romanyuk, V. Strelchuk, G. Lashkarev, O. Khyzhun, I. Timofeeva, V. Lazorenko, V. Khomyak
Format:	Article
Language:	English
Published:	2014
Series:	Semiconductor Physics, Quantum Electronics and Optoelectronics
Online Access:	http://jnas.nbuv.gov.ua/article/UJRN-0000352935
Tags:	Add Tag No Tags, Be the first to tag this record!
Journal Title:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

Institution

Library portal of National Academy of Sciences of Ukraine | LibNAS

Similar Items

Optical and structural studies of phase transformations and composition fluctuations at annealing of Zn₁₋xCdxO films grown by dc magnetron sputtering
by: Kolomys, O., et al.
Published: (2014)

Synthesis of TiO₂ different phase by DC magnetron sputtering
by: Dobrovolskiy, A., et al.
Published: (2014)

Formation of porous zinc nanosystems using direct and reverse flows of DC magnetron sputtering
by: Latyshev, V.M., et al.
Published: (2017)

Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B₄C target
by: Onoprienko, A.A., et al.
Published: (2015)

Characterization of Ti–B–C–N films deposited by dc magnetron sputtering of bicomponent Ti/B4C target
by: A. A. Onoprienko, et al.
Published: (2015)

Deposition of the stoichiometric coatings by reactive magnetron sputtering
by: Sagalovych, A., et al.
Published: (2012)

Deposition of the stoichiometric coatings by reactive magnetron sputtering
by: A. Sagalovych, et al.
Published: (2012)

Influence of nitrogen on the microstructure, hardness and tribological properties of Cr–Ni–B–C–N films deposited by DC magnetron sputtering
by: O. O. Onopriienko, et al.
Published: (2020)

Development of arc suppression technique for reactive magnetron sputtering
by: S. V. Dudin, et al.
Published: (2005)

Formation of antibacterial coatings on chitosan matrices by magnetron sputtering
by: O. V. Kalinkevich, et al.
Published: (2017)

Influence of parameters of magnetron sputtering process on phase composition and structure of carbon nitride coatings
by: Yu. S. Borysov, et al.
Published: (2022)

Solid ion accelerator based on magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2004)

Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target
by: A. A. Onoprienko, et al.
Published: (2019)

Synthesis of dielectric compounds based on a DC magnetron
by: O. V. Zykov, et al.
Published: (2009)

Structure of Fe-Cu coatings prepared by the magnetron sputtering method
by: Nowakowska-Langier, K., et al.
Published: (2010)

Evolution of the structure of Mo films obtained by magnetron sputtering on a-Si
by: V. A. Sevrjukova, et al.
Published: (2011)

Digital processing of optical emission spectra of magnetron sputtering plasma system
by: Afanasіeva, I.A., et al.
Published: (2019)

Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system
by: Yakovin, S., et al.
Published: (2017)

The flow density of atoms sputtered from a cathode of cylinder magnetron
by: Panchenko, O.A., et al.
Published: (2005)

Solid ion source based on hollow-cylindrical magnetron sputtering discharge
by: Azarenkov, N.A., et al.
Published: (2003)

Magnetron sputtered coatings of AlN-TiCrB₂ system
by: Panasyuk, A.D., et al.
Published: (2009)

Features of high-current pulsed regimes in regimes in magnetron sputtering systems
by: Bizyukov, A.A., et al.
Published: (2005)

The Vacuub Device for Receiving Coatings on the Inner Surface of the Pipes by Magnetron Sputtering
by: V. M. Kolomiiets, et al.
Published: (2020)

Structure and Photocatalytic Properties of Titania Nanofilms Deposited by Reactive Magnetron Sputtering
by: A. A. Goncharov, et al.
Published: (2014)

Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
by: Yakovin, S., et al.
Published: (2016)

Stydy on resistivity and micostructure of magnetron sputtered α-C:Si films
by: Onoprienko, A.A., et al.
Published: (2006)

Phase composition, structure and stress state of magnetron sputtered W-Ti condensates
by: Sobol`, O.V.
Published: (2006)

Experimental investigation and computer simulation of the magnetron sputtering device with two erosion zones
by: Bogdanov, R.V., et al.
Published: (2013)

Control of ionization processes in magnetron sputtering system by changing magnetic field configuration
by: Chunadra, А.G., et al.
Published: (2021)

The antimicrobial activity of magnetron sputtered Ag doped aluminum oxide coatings in vitro
by: Safonov, V., et al.
Published: (2019)

Infrared heaters with thin-film conductive layers were synthesized on the glass by the magnetron sputtering
by: Lytvynenko, V.V., et al.
Published: (2017)

Fabrication of nanosize LiPON films by means of high-frequency magnetron sputtering
by: O. I. Vjunov, et al.
Published: (2014)

Structure and properties of the coatings of the Al–B–Si–C system deposited by magnetron sputtering
by: A. O. Kozak, et al.
Published: (2020)

The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
by: A. I. Bazhin, et al.
Published: (2012)

Control of planar magnetron sputtering system operating modes by additional anode magnetic field
by: Bizyukov, A.A., et al.
Published: (2010)

ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
by: Boyko, B.Т., et al.
Published: (2000)

Influence of pulse thermal annealing on photoelectrical properties of locally grown polycrystalline silicon films
by: Mamikonova, V.M., et al.
Published: (1999)

Structural and optical studies of Cu₆PSe₅I-based thin film deposited by magnetron sputtering
by: Studenyak, I.P., et al.
Published: (2017)

Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system
by: Chunadra, А.G., et al.
Published: (2017)

Structural studies of zinc oxide and aluminum nitride films obtained by CVD and magnetron sputtering methods
by: A. D. Pogrebnjak, et al.
Published: (2012)