Photostimulated reversible changes in the Ge-Se films as a base of resistive process

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Бібліографічні деталі
Дата:2014
Автори: I. V. Babiichuk, V. A. Danko, I. Z. Indutnyi, M. V. Lukaniuk, V. I. Mynko, Ye. Shepeliavyi
Формат: Стаття
Мова:English
Опубліковано: 2014
Назва видання:Optoelectronics and Semiconductor Technique
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000363504
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-731262024-04-16T17:11:08Z Photostimulated reversible changes in the Ge-Se films as a base of resistive process I. V. Babiichuk V. A. Danko I. Z. Indutnyi M. V. Lukaniuk V. I. Mynko Ye. Shepeliavyi 2707-6806 2014 en Optoelectronics and Semiconductor Technique http://jnas.nbuv.gov.ua/article/UJRN-0000363504 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Optoelectronics and Semiconductor Technique
spellingShingle Optoelectronics and Semiconductor Technique
I. V. Babiichuk
V. A. Danko
I. Z. Indutnyi
M. V. Lukaniuk
V. I. Mynko
Ye. Shepeliavyi
Photostimulated reversible changes in the Ge-Se films as a base of resistive process
format Article
author I. V. Babiichuk
V. A. Danko
I. Z. Indutnyi
M. V. Lukaniuk
V. I. Mynko
Ye. Shepeliavyi
author_facet I. V. Babiichuk
V. A. Danko
I. Z. Indutnyi
M. V. Lukaniuk
V. I. Mynko
Ye. Shepeliavyi
author_sort I. V. Babiichuk
title Photostimulated reversible changes in the Ge-Se films as a base of resistive process
title_short Photostimulated reversible changes in the Ge-Se films as a base of resistive process
title_full Photostimulated reversible changes in the Ge-Se films as a base of resistive process
title_fullStr Photostimulated reversible changes in the Ge-Se films as a base of resistive process
title_full_unstemmed Photostimulated reversible changes in the Ge-Se films as a base of resistive process
title_sort photostimulated reversible changes in the ge-se films as a base of resistive process
publishDate 2014
url http://jnas.nbuv.gov.ua/article/UJRN-0000363504
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AT mvlukaniuk photostimulatedreversiblechangesinthegesefilmsasabaseofresistiveprocess
AT vimynko photostimulatedreversiblechangesinthegesefilmsasabaseofresistiveprocess
AT yeshepeliavyi photostimulatedreversiblechangesinthegesefilmsasabaseofresistiveprocess
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