Development of deep silicon plasma etching for 3D integration technology
Збережено в:
| Дата: | 2014 |
|---|---|
| Автори: | , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
2014
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| Назва видання: | Technology and design in electronic equipment |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000405244 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| id |
open-sciencenbuvgovua-73813 |
|---|---|
| record_format |
dspace |
| spelling |
open-sciencenbuvgovua-738132024-04-16T17:15:37Z Development of deep silicon plasma etching for 3D integration technology A. A. Golishnikov M. G. Putrja 2225-5818 2014 en Technology and design in electronic equipment http://jnas.nbuv.gov.ua/article/UJRN-0000405244 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Technology and design in electronic equipment |
| spellingShingle |
Technology and design in electronic equipment A. A. Golishnikov M. G. Putrja Development of deep silicon plasma etching for 3D integration technology |
| format |
Article |
| author |
A. A. Golishnikov M. G. Putrja |
| author_facet |
A. A. Golishnikov M. G. Putrja |
| author_sort |
A. A. Golishnikov |
| title |
Development of deep silicon plasma etching for 3D integration technology |
| title_short |
Development of deep silicon plasma etching for 3D integration technology |
| title_full |
Development of deep silicon plasma etching for 3D integration technology |
| title_fullStr |
Development of deep silicon plasma etching for 3D integration technology |
| title_full_unstemmed |
Development of deep silicon plasma etching for 3D integration technology |
| title_sort |
development of deep silicon plasma etching for 3d integration technology |
| publishDate |
2014 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000405244 |
| work_keys_str_mv |
AT aagolishnikov developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology AT mgputrja developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology |
| first_indexed |
2024-04-17T05:18:59Z |
| last_indexed |
2024-04-17T05:18:59Z |
| _version_ |
1796884978821234688 |