Development of deep silicon plasma etching for 3D integration technology
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| Datum: | 2014 |
|---|---|
| Hauptverfasser: | , |
| Format: | Artikel |
| Sprache: | Englisch |
| Veröffentlicht: |
2014
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| Schriftenreihe: | Technology and design in electronic equipment |
| Online Zugang: | http://jnas.nbuv.gov.ua/article/UJRN-0000405244 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
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Library portal of National Academy of Sciences of Ukraine | LibNAS| _version_ | 1859530465459830784 |
|---|---|
| author | A. A. Golishnikov M. G. Putrja |
| author_facet | A. A. Golishnikov M. G. Putrja |
| author_sort | A. A. Golishnikov |
| collection | Open-Science |
| first_indexed | 2025-07-22T07:19:48Z |
| format | Article |
| id | open-sciencenbuvgovua-73813 |
| institution | Library portal of National Academy of Sciences of Ukraine | LibNAS |
| language | English |
| last_indexed | 2025-07-22T07:19:48Z |
| publishDate | 2014 |
| record_format | dspace |
| series | Technology and design in electronic equipment |
| spelling | open-sciencenbuvgovua-738132024-04-16T17:15:37Z Development of deep silicon plasma etching for 3D integration technology A. A. Golishnikov M. G. Putrja 2225-5818 2014 en Technology and design in electronic equipment http://jnas.nbuv.gov.ua/article/UJRN-0000405244 Article |
| spellingShingle | Technology and design in electronic equipment A. A. Golishnikov M. G. Putrja Development of deep silicon plasma etching for 3D integration technology |
| title | Development of deep silicon plasma etching for 3D integration technology |
| title_full | Development of deep silicon plasma etching for 3D integration technology |
| title_fullStr | Development of deep silicon plasma etching for 3D integration technology |
| title_full_unstemmed | Development of deep silicon plasma etching for 3D integration technology |
| title_short | Development of deep silicon plasma etching for 3D integration technology |
| title_sort | development of deep silicon plasma etching for 3d integration technology |
| url | http://jnas.nbuv.gov.ua/article/UJRN-0000405244 |
| work_keys_str_mv | AT aagolishnikov developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology AT mgputrja developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology |