Development of deep silicon plasma etching for 3D integration technology

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Bibliographic Details
Date:2014
Main Authors: A. A. Golishnikov, M. G. Putrja
Format: Article
Language:English
Published: 2014
Series:Technology and design in electronic equipment
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000405244
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Journal Title:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author A. A. Golishnikov
M. G. Putrja
author_facet A. A. Golishnikov
M. G. Putrja
author_sort A. A. Golishnikov
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first_indexed 2025-07-22T07:19:48Z
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
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publishDate 2014
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series Technology and design in electronic equipment
spelling open-sciencenbuvgovua-738132024-04-16T17:15:37Z Development of deep silicon plasma etching for 3D integration technology A. A. Golishnikov M. G. Putrja 2225-5818 2014 en Technology and design in electronic equipment http://jnas.nbuv.gov.ua/article/UJRN-0000405244 Article
spellingShingle Technology and design in electronic equipment
A. A. Golishnikov
M. G. Putrja
Development of deep silicon plasma etching for 3D integration technology
title Development of deep silicon plasma etching for 3D integration technology
title_full Development of deep silicon plasma etching for 3D integration technology
title_fullStr Development of deep silicon plasma etching for 3D integration technology
title_full_unstemmed Development of deep silicon plasma etching for 3D integration technology
title_short Development of deep silicon plasma etching for 3D integration technology
title_sort development of deep silicon plasma etching for 3d integration technology
url http://jnas.nbuv.gov.ua/article/UJRN-0000405244
work_keys_str_mv AT aagolishnikov developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology
AT mgputrja developmentofdeepsiliconplasmaetchingfor3dintegrationtechnology