Structure and Photocatalytic Properties of Titania Nanofilms Deposited by Reactive Magnetron Sputtering

Structure and Photocatalytic Properties of Titania Nanofilms Deposited by Reactive Magnetron Sputtering

Gespeichert in:

Bibliographische Detailangaben
Datum:	2014
Hauptverfasser:	A. A. Goncharov, A. N. Dobrovolskij, E. G. Kostin, I. S. Petrik, E. K. Frolova
Format:	Artikel
Sprache:	English
Veröffentlicht:	2014
Schriftenreihe:	Metallophysics and advanced technologies
Online Zugang:	http://jnas.nbuv.gov.ua/article/UJRN-0000478695
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!
Назва журналу:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

Institution

Library portal of National Academy of Sciences of Ukraine | LibNAS

Ähnliche Einträge

Gas magnetron deposition of structured TiO₂ nanofilms
von: Dobrovolskiy, A.M., et al.
Veröffentlicht: (2013)

Deposition of the stoichiometric coatings by reactive magnetron sputtering
von: A. Sagalovych, et al.
Veröffentlicht: (2012)

Deposition of the stoichiometric coatings by reactive magnetron sputtering
von: Sagalovych, A., et al.
Veröffentlicht: (2012)

Synthesis of TiO₂ different phase by DC magnetron sputtering
von: Dobrovolskiy, A., et al.
Veröffentlicht: (2014)

Influence of metal and non-metal ions doping on the structural and photocatalytic properties of titania films
von: N. A. Shestopal, et al.
Veröffentlicht: (2015)

Synthesis, optical and photocatalytic properties of mesoporous iron doped titania films
von: N. A. Chorna, et al.
Veröffentlicht: (2017)

Development of arc suppression technique for reactive magnetron sputtering
von: S. V. Dudin, et al.
Veröffentlicht: (2005)

Development of arc suppression technique for reactive magnetron sputtering
von: Dudin, S.V., et al.
Veröffentlicht: (2005)

Structure and properties of the coatings of the Al–B–Si–C system deposited by magnetron sputtering
von: A. O. Kozak, et al.
Veröffentlicht: (2020)

Synthesis of thin-film Ta₂O₅ coatings by reactive magnetron sputtering
von: Yakovin, S., et al.
Veröffentlicht: (2016)

Plasma assisted deposition of TaB₂ coatings by magnetron sputtering system
von: Yakovin, S., et al.
Veröffentlicht: (2017)

Structure of tantalum diboride thin films deposited by RF-magnetron sputtering
von: Konovalov, V.A., et al.
Veröffentlicht: (2008)

Nonporous platinum doped titania films: synthesis, optical and photocatalytic characteristics
von: D. V. Ihnatiuk, et al.
Veröffentlicht: (2017)

Ion-plasma system for reactive magnetron deposition
von: S. D. Yakovin, et al.
Veröffentlicht: (2014)

Low-Temperature Synthesis and Structure of Hybrid Ni@C Nanomaterials Fabricated by Method of Reactive Magnetron Sputtering
von: M. I. Mokhnenko, et al.
Veröffentlicht: (2015)

Sol-gel synthesis, optical properties, morphology and photocatalytic activity of titania films modified with ethanolamines as nitrogen source
von: O. P. Linnik, et al.
Veröffentlicht: (2012)

Sol-gel synthesis, optical properties, morphology and photocatalytic activity of titania films modified with ethanolamines as nitrogen source
von: Linnik, O.P., et al.
Veröffentlicht: (2012)

Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B₄C target
von: Onoprienko, A.A., et al.
Veröffentlicht: (2019)

Optical properties of AlN/n-Si(111) films obtained by method of HF reactive magnetron sputtering
von: Zayats, M.S., et al.
Veröffentlicht: (2010)

The flow density of atoms sputtered from a cathode of cylinder magnetron
von: Panchenko, O.A., et al.
Veröffentlicht: (2005)

The investigation of the optical spectra in process of magnetron deposition
von: Demchishin, A.V., et al.
Veröffentlicht: (2008)

Deposition and characterization of thin Si–B–C–N films by dc reactive magnetron sputtering of composed Si/B4C target
von: A. A. Onoprienko, et al.
Veröffentlicht: (2019)

Comparison of optical properties of TiO₂ thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
von: Brus, V.V., et al.
Veröffentlicht: (2011)

Comparison of optical properties of TiO2 thin films prepared by reactive magnetron sputtering and electron-beam evaporation techniques
von: V. V. Brus, et al.
Veröffentlicht: (2011)

Band-gap change and photocatalytic activity of silica/titania composites associated with incorporation of CuO and NiO
von: M. A. Nazarkovsky, et al.
Veröffentlicht: (2014)

The influence of the magnetron sputtering regime and the composition of the reaction gas on the structure and properties of ITO films
von: A. I. Bazhin, et al.
Veröffentlicht: (2012)

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering
von: V. I. Popovych, et al.
Veröffentlicht: (2016)

Effect of argon deposition pressure on the properties of aluminum-doped ZnO films deposited layer-by-layer using magnetron sputtering
von: V. I. Popovych, et al.
Veröffentlicht: (2016)

Optical and mass spectra from reactive plasma at magnetron deposition of tantalum oxynitride
von: Dudin, S., et al.
Veröffentlicht: (2021)

Evolution of the structure of Mo films obtained by magnetron sputtering on a-Si
von: V. A. Sevrjukova, et al.
Veröffentlicht: (2011)

Features of coatings deposition in combined stationary-pulsed operation mode of the magnetron sputtering system
von: Chunadra, А.G., et al.
Veröffentlicht: (2017)

The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method
von: A. I. Ievtushenko, et al.
Veröffentlicht: (2017)

Structural and optical studies of Cu6PSe5I-based thin film deposited by magnetron sputtering
von: I. P. Studenyak, et al.
Veröffentlicht: (2017)

ZnO:Al wide zone “windows” deposited by magnetron sputtering on unheated substrate
von: Boyko, B.Т., et al.
Veröffentlicht: (2000)

Structure of Fe-Cu coatings prepared by the magnetron sputtering method
von: Nowakowska-Langier, K., et al.
Veröffentlicht: (2010)

Influence of nitrogen on the microstructure, hardness and tribological properties of Cr–Ni–B–C–N films deposited by DC magnetron sputtering
von: O. O. Onopriienko, et al.
Veröffentlicht: (2020)

The influence of physical and technological magnetron sputtering modes on the structure and optical properties of CdS and CdTe films
von: G. S. Khrypunov, et al.
Veröffentlicht: (2017)

Solid ion accelerator based on magnetron sputtering discharge
von: Azarenkov, N.A., et al.
Veröffentlicht: (2004)

Characterisation of Mo–V–N Coatings Deposited on XC100 Substrate by Sputtering Cathodic Magnetron
von: Chermime, Brahim, et al.
Veröffentlicht: (2017)

Effect of nitrogen partial pressure on reactive magnetron sputtering from Ti13Cu87 metalloid target: simulation of chemical composition
von: A. Rahmati, et al.
Veröffentlicht: (2012)