Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
Збережено в:
| Дата: | 2014 |
|---|---|
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | Англійська |
| Опубліковано: |
2014
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| Назва видання: | Ukrainian journal of physics |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000696134 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| _version_ | 1859533449126215680 |
|---|---|
| author | O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko |
| author_facet | O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko |
| author_sort | O. O. Gavrylyuk |
| collection | Open-Science |
| first_indexed | 2025-07-22T08:11:00Z |
| format | Article |
| id | open-sciencenbuvgovua-77353 |
| institution | Library portal of National Academy of Sciences of Ukraine | LibNAS |
| language | English |
| last_indexed | 2025-07-22T08:11:00Z |
| publishDate | 2014 |
| record_format | dspace |
| series | Ukrainian journal of physics |
| spelling | open-sciencenbuvgovua-773532024-04-16T17:41:27Z Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko 2071-0186 2014 en Ukrainian journal of physics http://jnas.nbuv.gov.ua/article/UJRN-0000696134 Article |
| spellingShingle | Ukrainian journal of physics O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title | Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_full | Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_fullStr | Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_full_unstemmed | Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_short | Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_sort | study of the distribution of temperature profiles in nonstoichiometric siox films at laser annealing |
| url | http://jnas.nbuv.gov.ua/article/UJRN-0000696134 |
| work_keys_str_mv | AT oogavrylyuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT yusemchuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT ovsteblova studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT aaevtukh studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT llfedorenko studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing |