Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing

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Datum:2014
Hauptverfasser: O. O. Gavrylyuk, Yu. Semchuk, O. V. Steblova, A. A. Evtukh, L. L. Fedorenko
Format: Artikel
Sprache:Englisch
Veröffentlicht: 2014
Schriftenreihe:Ukrainian journal of physics
Online Zugang:http://jnas.nbuv.gov.ua/article/UJRN-0000696134
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_facet O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_sort O. O. Gavrylyuk
collection Open-Science
first_indexed 2025-07-22T08:11:00Z
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
language English
last_indexed 2025-07-22T08:11:00Z
publishDate 2014
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series Ukrainian journal of physics
spelling open-sciencenbuvgovua-773532024-04-16T17:41:27Z Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko 2071-0186 2014 en Ukrainian journal of physics http://jnas.nbuv.gov.ua/article/UJRN-0000696134 Article
spellingShingle Ukrainian journal of physics
O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_fullStr Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full_unstemmed Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_short Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_sort study of the distribution of temperature profiles in nonstoichiometric siox films at laser annealing
url http://jnas.nbuv.gov.ua/article/UJRN-0000696134
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AT yusemchuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT ovsteblova studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT aaevtukh studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT llfedorenko studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing