Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
Збережено в:
| Дата: | 2014 |
|---|---|
| Автори: | , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
2014
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| Назва видання: | Ukrainian Journal of Physics |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000726343 |
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| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
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Library portal of National Academy of Sciences of Ukraine | LibNAS| id |
open-sciencenbuvgovua-77625 |
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open-sciencenbuvgovua-776252024-04-16T17:43:44Z Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko 0372-400X 2014 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000726343 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Ukrainian Journal of Physics |
| spellingShingle |
Ukrainian Journal of Physics O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| format |
Article |
| author |
O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko |
| author_facet |
O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko |
| author_sort |
O. O. Gavrylyuk |
| title |
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_short |
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_full |
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_fullStr |
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_full_unstemmed |
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing |
| title_sort |
study of the distribution of temperature profiles in nonstoichiometric siox films at laser annealing |
| publishDate |
2014 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000726343 |
| work_keys_str_mv |
AT oogavrylyuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT yusemchuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT ovsteblova studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT aaevtukh studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing AT llfedorenko studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing |
| first_indexed |
2024-04-17T05:34:28Z |
| last_indexed |
2024-04-17T05:34:28Z |
| _version_ |
1796885377232928768 |