Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing

Збережено в:
Бібліографічні деталі
Дата:2014
Автори: O. O. Gavrylyuk, Yu. Semchuk, O. V. Steblova, A. A. Evtukh, L. L. Fedorenko
Формат: Стаття
Мова:Англійська
Опубліковано: 2014
Назва видання:Ukrainian Journal of Physics
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000726343
Теги: Додати тег
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS
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author O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_facet O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_sort O. O. Gavrylyuk
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institution Library portal of National Academy of Sciences of Ukraine | LibNAS
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series Ukrainian Journal of Physics
spelling open-sciencenbuvgovua-776252024-04-16T17:43:44Z Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko 0372-400X 2014 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000726343 Article
spellingShingle Ukrainian Journal of Physics
O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_fullStr Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full_unstemmed Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_short Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_sort study of the distribution of temperature profiles in nonstoichiometric siox films at laser annealing
url http://jnas.nbuv.gov.ua/article/UJRN-0000726343
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AT yusemchuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT ovsteblova studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT aaevtukh studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT llfedorenko studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing