Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing

Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing

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Bibliographic Details
Date:2014
Main Authors: O. O. Gavrylyuk, Yu. Semchuk, O. V. Steblova, A. A. Evtukh, L. L. Fedorenko
Format: Article
Language:English
Published: 2014
Series:Ukrainian Journal of Physics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000726343
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Library portal of National Academy of Sciences of Ukraine | LibNAS
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spelling open-sciencenbuvgovua-776252024-04-16T17:43:44Z Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing O. O. Gavrylyuk Yu. Semchuk O. V. Steblova A. A. Evtukh L. L. Fedorenko 0372-400X 2014 en Ukrainian Journal of Physics http://jnas.nbuv.gov.ua/article/UJRN-0000726343 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Ukrainian Journal of Physics
spellingShingle Ukrainian Journal of Physics
O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
format Article
author O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_facet O. O. Gavrylyuk
Yu. Semchuk
O. V. Steblova
A. A. Evtukh
L. L. Fedorenko
author_sort O. O. Gavrylyuk
title Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_short Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_fullStr Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_full_unstemmed Study of the distribution of temperature profiles in nonstoichiometric SiOx films at laser annealing
title_sort study of the distribution of temperature profiles in nonstoichiometric siox films at laser annealing
publishDate 2014
url http://jnas.nbuv.gov.ua/article/UJRN-0000726343
work_keys_str_mv AT oogavrylyuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT yusemchuk studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT ovsteblova studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT aaevtukh studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
AT llfedorenko studyofthedistributionoftemperatureprofilesinnonstoichiometricsioxfilmsatlaserannealing
first_indexed 2025-07-22T08:14:31Z
last_indexed 2025-07-22T08:14:31Z
_version_ 1850419468993298432

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