Bihun, R. I., Buchkovska, M. D., Stasiuk, Z. V., & Leonov, D. S. (2013). Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness.
Chicago-Zitierstil (17. Ausg.)Bihun, R. I., M. D. Buchkovska, Z. V. Stasiuk, und D. S. Leonov. Formation of Metallic Character of Electrical Conduction in the Vacuum Condensates of Copper Deposited on a Surface of a Sublayer of Silicon of Subatomic Thickness. 2013.
MLA-Zitierstil (8. Ausg.)Bihun, R. I., et al. Formation of Metallic Character of Electrical Conduction in the Vacuum Condensates of Copper Deposited on a Surface of a Sublayer of Silicon of Subatomic Thickness. 2013.
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