Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness

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Datum:2013
Hauptverfasser: R. I. Bihun, M. D. Buchkovska, Z. V. Stasiuk, D. S. Leonov
Format: Artikel
Sprache:English
Veröffentlicht: 2013
Schriftenreihe:Nanosystems, nanomaterials, nanotechnologies
Online Zugang:http://jnas.nbuv.gov.ua/article/UJRN-0000475583
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spelling open-sciencenbuvgovua-852642024-04-16T18:44:05Z Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness R. I. Bihun M. D. Buchkovska Z. V. Stasiuk D. S. Leonov 1816-5230 2013 en Nanosystems, nanomaterials, nanotechnologies http://jnas.nbuv.gov.ua/article/UJRN-0000475583 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Nanosystems, nanomaterials, nanotechnologies
spellingShingle Nanosystems, nanomaterials, nanotechnologies
R. I. Bihun
M. D. Buchkovska
Z. V. Stasiuk
D. S. Leonov
Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
format Article
author R. I. Bihun
M. D. Buchkovska
Z. V. Stasiuk
D. S. Leonov
author_facet R. I. Bihun
M. D. Buchkovska
Z. V. Stasiuk
D. S. Leonov
author_sort R. I. Bihun
title Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
title_short Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
title_full Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
title_fullStr Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
title_full_unstemmed Formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
title_sort formation of metallic character of electrical conduction in the vacuum condensates of copper deposited on a surface of a sublayer of silicon of subatomic thickness
publishDate 2013
url http://jnas.nbuv.gov.ua/article/UJRN-0000475583
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AT mdbuchkovska formationofmetalliccharacterofelectricalconductioninthevacuumcondensatesofcopperdepositedonasurfaceofasublayerofsiliconofsubatomicthickness
AT zvstasiuk formationofmetalliccharacterofelectricalconductioninthevacuumcondensatesofcopperdepositedonasurfaceofasublayerofsiliconofsubatomicthickness
AT dsleonov formationofmetalliccharacterofelectricalconductioninthevacuumcondensatesofcopperdepositedonasurfaceofasublayerofsiliconofsubatomicthickness
first_indexed 2025-07-22T10:36:11Z
last_indexed 2025-07-22T10:36:11Z
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