Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin

Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin

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Bibliographic Details
Date:2013
Main Authors: R. M. Rudenko, V. V. Voitovych, M. M. Krasko, A. G. Kolosyuk, A. M. Kraichynskyi, V. O. Yukhymchuk, V. A. Makara
Format: Article
Language:English
Published: 2013
Series:Ukrainian journal of physics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000690902
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Library portal of National Academy of Sciences of Ukraine | LibNAS
id open-sciencenbuvgovua-87149
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spelling open-sciencenbuvgovua-871492024-04-16T18:56:02Z Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin R. M. Rudenko V. V. Voitovych M. M. Krasko A. G. Kolosyuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara 2071-0186 2013 en Ukrainian journal of physics http://jnas.nbuv.gov.ua/article/UJRN-0000690902 Article
institution Library portal of National Academy of Sciences of Ukraine | LibNAS
collection Open-Science
language English
series Ukrainian journal of physics
spellingShingle Ukrainian journal of physics
R. M. Rudenko
V. V. Voitovych
M. M. Krasko
A. G. Kolosyuk
A. M. Kraichynskyi
V. O. Yukhymchuk
V. A. Makara
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
format Article
author R. M. Rudenko
V. V. Voitovych
M. M. Krasko
A. G. Kolosyuk
A. M. Kraichynskyi
V. O. Yukhymchuk
V. A. Makara
author_facet R. M. Rudenko
V. V. Voitovych
M. M. Krasko
A. G. Kolosyuk
A. M. Kraichynskyi
V. O. Yukhymchuk
V. A. Makara
author_sort R. M. Rudenko
title Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
title_short Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
title_full Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
title_fullStr Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
title_full_unstemmed Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
title_sort influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
publishDate 2013
url http://jnas.nbuv.gov.ua/article/UJRN-0000690902
work_keys_str_mv AT rmrudenko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT vvvoitovych influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT mmkrasko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT agkolosyuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT amkraichynskyi influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT voyukhymchuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
AT vamakara influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin
first_indexed 2025-07-22T11:12:04Z
last_indexed 2025-07-22T11:12:04Z
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