Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin
Збережено в:
| Дата: | 2013 |
|---|---|
| Автори: | , , , , , , |
| Формат: | Стаття |
| Мова: | English |
| Опубліковано: |
2013
|
| Назва видання: | Ukrainian journal of physics |
| Онлайн доступ: | http://jnas.nbuv.gov.ua/article/UJRN-0000690902 |
| Теги: |
Додати тег
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|
| Назва журналу: | Library portal of National Academy of Sciences of Ukraine | LibNAS |
Репозитарії
Library portal of National Academy of Sciences of Ukraine | LibNAS| id |
open-sciencenbuvgovua-87149 |
|---|---|
| record_format |
dspace |
| spelling |
open-sciencenbuvgovua-871492024-04-16T18:56:02Z Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin R. M. Rudenko V. V. Voitovych M. M. Krasko A. G. Kolosyuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara 2071-0186 2013 en Ukrainian journal of physics http://jnas.nbuv.gov.ua/article/UJRN-0000690902 Article |
| institution |
Library portal of National Academy of Sciences of Ukraine | LibNAS |
| collection |
Open-Science |
| language |
English |
| series |
Ukrainian journal of physics |
| spellingShingle |
Ukrainian journal of physics R. M. Rudenko V. V. Voitovych M. M. Krasko A. G. Kolosyuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| format |
Article |
| author |
R. M. Rudenko V. V. Voitovych M. M. Krasko A. G. Kolosyuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara |
| author_facet |
R. M. Rudenko V. V. Voitovych M. M. Krasko A. G. Kolosyuk A. M. Kraichynskyi V. O. Yukhymchuk V. A. Makara |
| author_sort |
R. M. Rudenko |
| title |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| title_short |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| title_full |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| title_fullStr |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| title_full_unstemmed |
Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| title_sort |
influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin |
| publishDate |
2013 |
| url |
http://jnas.nbuv.gov.ua/article/UJRN-0000690902 |
| work_keys_str_mv |
AT rmrudenko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT vvvoitovych influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT mmkrasko influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT agkolosyuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT amkraichynskyi influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT voyukhymchuk influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin AT vamakara influenceofhightemperatureannealingonthestructureandtheintrinsicabsorptionedgeofthinfilmsilicondopedwithtin |
| first_indexed |
2024-04-17T06:13:36Z |
| last_indexed |
2024-04-17T06:13:36Z |
| _version_ |
1796886372453187584 |