Behavior of hydrogen during crystallization of thin silicon films doped with tin - R. M. Rudenko; M. M. Krasko; V. V. Voitovych; A. G. Kolosyuk; Yu. Povarchuk; A. M. Kraichynskyi; V. O. Yukhymchuck; Ya. Bratus; M. V. Voitovych; I. A. Zaloilo (Ukrainian journal of physics, 2013)