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Influence of high temperature annealing on the structure and the intrinsic absorption edge of thin-film silicon doped with tin

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Bibliographic Details
Date:	2013
Main Authors:	R. M. Rudenko, V. V. Voitovych, M. M. Krasko, A. H. Kolosiuk, A. M. Kraichynskyi, V. O. Yukhymchuk, V. A. Makara
Format:	Article
Language:	English
Published:	2013
Series:	Ukrainian Journal of Physics
Online Access:	http://jnas.nbuv.gov.ua/article/UJRN-0000725577
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Journal Title:	Library portal of National Academy of Sciences of Ukraine \| LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

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