Behavior of hydrogen during crystallization of thin silicon films doped with tin - R. M. Rudenko; M. M. Krasko; V. V. Voitovych; A. H. Kolosiuk; Yu. Povarchuk; A. M. Kraichynskyi; V. O. Yukhymchuk; M. V. Voitovych; Ya. Bratus; I. A. Zaloilo (Ukrainian Journal of Physics, 2013)