Behavior of hydrogen during crystallization of thin silicon films doped with tin

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Bibliographic Details
Date:2013
Main Authors: R. M. Rudenko, M. M. Krasko, V. V. Voitovych, A. H. Kolosiuk, Yu. Povarchuk, A. M. Kraichynskyi, V. O. Yukhymchuk, M. V. Voitovych, Ya. Bratus, I. A. Zaloilo
Format: Article
Language:English
Published: 2013
Series:Ukrainian Journal of Physics
Online Access:http://jnas.nbuv.gov.ua/article/UJRN-0000725625
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Journal Title:Library portal of National Academy of Sciences of Ukraine | LibNAS

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Library portal of National Academy of Sciences of Ukraine | LibNAS

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