Perspectives for using technology of laser thermolithography

Збережено в:
Бібліографічні деталі
Дата:2012
Автори: A. A. Kryuchyn, A. S. Lapchuk, A. I. Brytskyi, S. O. Kostyukevych
Формат: Стаття
Мова:Англійська
Опубліковано: 2012
Назва видання:Semiconductor Physics, Quantum Electronics and Optoelectronics
Онлайн доступ:http://jnas.nbuv.gov.ua/article/UJRN-0000350385
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Назва журналу:Library portal of National Academy of Sciences of Ukraine | LibNAS

Репозитарії

Library portal of National Academy of Sciences of Ukraine | LibNAS
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author A. A. Kryuchyn
A. S. Lapchuk
A. I. Brytskyi
S. O. Kostyukevych
author_facet A. A. Kryuchyn
A. S. Lapchuk
A. I. Brytskyi
S. O. Kostyukevych
author_sort A. A. Kryuchyn
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series Semiconductor Physics, Quantum Electronics and Optoelectronics
spelling open-sciencenbuvgovua-907602024-04-17T16:37:47Z Perspectives for using technology of laser thermolithography A. A. Kryuchyn A. S. Lapchuk A. I. Brytskyi S. O. Kostyukevych 1560-8034 2012 en Semiconductor Physics, Quantum Electronics and Optoelectronics http://jnas.nbuv.gov.ua/article/UJRN-0000350385 Article
spellingShingle Semiconductor Physics, Quantum Electronics and Optoelectronics
A. A. Kryuchyn
A. S. Lapchuk
A. I. Brytskyi
S. O. Kostyukevych
Perspectives for using technology of laser thermolithography
title Perspectives for using technology of laser thermolithography
title_full Perspectives for using technology of laser thermolithography
title_fullStr Perspectives for using technology of laser thermolithography
title_full_unstemmed Perspectives for using technology of laser thermolithography
title_short Perspectives for using technology of laser thermolithography
title_sort perspectives for using technology of laser thermolithography
url http://jnas.nbuv.gov.ua/article/UJRN-0000350385
work_keys_str_mv AT aakryuchyn perspectivesforusingtechnologyoflaserthermolithography
AT aslapchuk perspectivesforusingtechnologyoflaserthermolithography
AT aibrytskyi perspectivesforusingtechnologyoflaserthermolithography
AT sokostyukevych perspectivesforusingtechnologyoflaserthermolithography